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Mixed Analog-Digital Vlsi Device and Technology by Yannis Tsividis

By Yannis Tsividis

Increase your circuit-design power with this specialist consultant to the units and expertise utilized in combined analog electronic VLSI chips for such high-volume functions as hard-disk drives, instant phones, and patron electronics. The booklet will give you a serious realizing of machine versions, fabrication know-how, and format as they practice to combined analog electronic circuits. you are going to know about the numerous device-modeling requisites for analog paintings, in addition to the pitfalls in types used this day for computing device simulators reminiscent of Spice. additionally incorporated is info on fabrication applied sciences built particularly for mixed-signal VLSI chips, plus information at the structure of combined analog electronic chips for a excessive measure of analog-device matching and minimal digital-to-analog interference. This reference ebook positive factors an intuitive advent to MOSFET operation that would show you how to view with perception any MOSFET version in addition to thorough discussions on precious large-signal and small-signal types. jam-packed with functional info, this first-of-its-kind publication can help you take hold of the nuances of mixed-signal VLSI-device types and format which are the most important to the layout of high-performance chips.

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For drift current, this can be seen as follows. The drift current is proportional to the velocity of electrons, which in t u r n is proportional to the electric field, if the latter is not too high to cause velocity saturation. The electric field along the channel results from the distribution of the total potential VDS across the channel, over a distance of length L. For a given VDS, the electric field at a point in the channel (at a given fractional distance from the source, say, at the middle of the channel) is inversely proportional to L (for very small VDS, in fact, the field is approximately constant along the channel and equal to VDSIL).

8 Factors Affecting the Extrapolated Threshold Voltage As indicated in the previous section, the value of VT depends on VSB due to the body effect. The special value of VT obtained when VSB = 0 is denoted by VTO and is a quantity used widely in MOS transistor modeling and circuit design. We now discuss the fabrication process parameters t h a t affect this value. The quantity VTO is, roughly speaking, a value of VGS around which the inversion level changes from weak, through moderate, to strong.

If it is desired to restore the number of electrons to what it was before VSB was raised, then VGS will have to be increased, as shown in Fig. 3c. The above effect of the channel-body bias on the inversion level is called the body effect, or substrate effect. Since VBS - -VSB, increasing VSB means making the body potential more negative with respect to the source. Thus decreasing the body potential (with respect to the source) decreases the number of electrons, just as decreasing the gate potential (again, with respect to the source) would.

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