By Ban Wong, Franz Zach, Victor Moroz, Anurag Mittal, Greg Starr, Andrew Kahng(auth.)
Notice cutting edge instruments that pave the way in which from circuit and actual layout to fabrication processing
Nano-CMOS layout for Manufacturability examines the demanding situations that layout engineers face within the nano-scaled period, equivalent to exacerbated results and the confirmed layout for manufacturability (DFM) technique in the middle of expanding variability and layout approach interactions. as well as discussing the problems because of the continuing dimensional scaling in conformance with Moore's legislation, the authors additionally take on complicated matters within the layout approach to beat the problems, together with using a sensible first silicon to aid a predictable product ramp. in addition, they introduce a number of rising recommendations, together with pressure proximity results, contour-based extraction, and layout technique interactions.
This publication is the sequel to Nano-CMOS Circuit and actual layout, taking layout to know-how nodes past 65nm geometries. it truly is divided into 3 elements:
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half One, Newly Exacerbated results, introduces the newly exacerbated results that require designers' awareness, starting with a dialogue of the lithography elements of DFM, by means of the influence of format on transistor functionality
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half , layout recommendations, examines find out how to mitigate the influence of approach results, discussing the method had to make sub-wavelength patterning expertise paintings in production, in addition to layout recommendations to accommodate sign, energy integrity, good, tension proximity results, and method variability
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half 3, the line to DFM, describes new instruments had to help DFM efforts, together with an auto-correction instrument in a position to solving the format of cells with a number of optimization objectives, through a glance forward into the way forward for DFM
through the ebook, real-world examples simplify advanced suggestions, supporting readers see how they could effectively deal with tasks on Nano-CMOS nodes. It presents a bridge that enables engineers to head from actual and circuit layout to fabrication processing and, briefly, make designs that aren't merely practical, yet that still meet strength and function ambitions in the layout schedule.Content:
Chapter 1 creation (pages 1–17):
Chapter 2 Lithography?Related elements of DFM (pages 19–125):
Chapter three interplay of format with Transistor functionality and rigidity Engineering innovations (pages 126–183):
Chapter four sign and gear Integrity (pages 185–255):
Chapter five Analog and Mixed?Signal Circuit layout for Yield and Manufacturability (pages 256–280):
Chapter 6 layout for Variability, functionality, and Yield (pages 281–332):
Chapter 7 Nano?CMOS layout instruments: past Model?Based research and Correction (pages 333–380):